A Method of Forming Thin Niobium Carbonitride Superconducting Films of Exceptional Purity

摘要

Thin superconducting NbCN films are deposited by reactive sputtering onto a dielectric substrate inside a vacuum chamber of 10 to the -10 Torr. The substrate is heated to a temperature of 600-1200 C, ultra-pure Argon is introduced into the chamber, and niobium is presputtered from a high-purity target onto a shutter. A cyanogen and nitrogen gas mixture is introduced into the chamber at a rate of approximately 10 to the -6 torr liters/sec, and a shutter is opened exposing the substrate to the sputtered niobium. The deposited niobium reacts with the cyanogen to form NbCN films of exceptional purity, and which exhibit superior superconductor properties. (Author)