In-situ Topographical Imaging of Electrode Surfaces Using High Resolution Phase-Measurement Interferometric Microscopy.

摘要

Three-dimensional topographical imaging of electrode surfaces using phase-measurement interferometric microscopy is described. Topographical measurements are based on a rapid, non-destructive optical method that provides ultrahigh vertical resolution (0.6 nm) and moderate horizontal resolution (0.5 microns). In-situ images of electrodes prepared from highly oriented pyrolytic graphite, platinum thin films, and polycrystalline iron are reported. In-situ measurement of the time-dependent growth of corrosion pits on FE in 0.1 M H2S04 is also demonstrated. (JHD)