METHOD AND APPARATUS FOR ENHANCED RESOLUTION OF HIGH SPATIAL FREQUENCY COMPONENTS OF IMAGES USING STANDING WAVE BEAMS IN NON-INTERFEROMETRIC AND INTERFEROMETRIC MICROSCOPY

摘要

A method of measuring properties of a substrate, the method involving: illuminating a spot on the substrate with a standing wave measurement beam to generate a return measurement beam, the standing wave measurement beam characterized by a standing wave pattern; generating an electrical signal from the return measurement beam; causing the standing wave pattern to be at a succession of different positions on the surface of the substrate; and for each of the succession of different positions of the standing wave pattern, acquiring measurement data from the electrical signal.