Program in the Chemistry of Electronic Materials. Task 1. New OrganometallicPrecursors for the Low Pressure Chemical Vapor Deposition of Refractory Materials for Electronics

摘要

The principal focus of this Project was the design and synthesis of volatileorganometallic precursors for the LPCVD of AlN, SiC, and other materials of interest for applications in electronics. The pyrolytic decomposition of theses compounds were investigated using mass spectrometry and IR spectroscopy and the resultant thin films examined by Auger spectroscopy and SEM/TEM to determine the composition, microstructure, and purity of the phases present. Through the use of selected precursors of this type, high quality, films of stoichiometric AlN and