Constant-Depth Scratch Test for the Measurement of Adhesion at Film-Substrate Interfaces.

摘要

This thesis reviews the development of the constant-depth Scratch Test for determining the adhesive shear strength of thin film-substrate interfaces, and proposes refinements to the theoretical analyses and experimental approach which were developed earlier. Modifications were made to incorporate a change in indenter orientation (for a Vicker's pyramidal indenter) as a measure to minimize damage during scratching. Additionally, the model was expanded to include the use of a conical indenter. A review of film failure modes was conducted, and the damage mechanism of forward lateral flaking was incorporated into the model. The data acquisition program was changed to reflect these modifications. Improvements were added to the previously constructed apparatus. Preliminary tests were conducted on chromium-on-glass samples, the results of which are also presented. Scratch Test, Interfacial Shear Strength, Thin Films.