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A new mechanism for modulation of Schottky barrier heights on silicon nanowires

机译:硅纳米线上肖特基势垒高度调制的新机制

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摘要

For nanowires with Schottky barriers on the end surfaces, charges on the walls of the wire are close enough to the metal-semiconductor interface to influence the Schottky barrier. This is similar to an effect in planar structures, where impurities with energy levels below the Fermi level in the bulk of the substrate material will. change charge state in the depletion region of a metal-semiconductor structure if the Schottky barrier is high enough to bring the impurity energy level above the Fermi level. The mechanism for barrier modulation is the same in both cases and occurs in nanowires as a result of the wire geometry. (C) 2007 Elsevier B.V. All rights reserved.
机译:对于在端表面上具有肖特基势垒的纳米线,导线壁上的电荷足够靠近金属-半导体界面以影响肖特基势垒。这类似于平面结构中的效果,在平面结构中,大部分衬底材料中的能级低于费米能级的杂质会。如果肖特基势垒足够高以使杂质能级超过费米能级,则改变金属半导体结构耗尽区的电荷状态。在两种情况下,势垒调制的机制都是相同的,并且由于导线的几何形状而在纳米线中发生。 (C)2007 Elsevier B.V.保留所有权利。

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