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首页> 外文期刊>Physica, C. Superconductivity and its applications >Texture and surface morphology of yttria-stabilized zirconia buffer layer on Ni-based tapes by electron beam evaporation
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Texture and surface morphology of yttria-stabilized zirconia buffer layer on Ni-based tapes by electron beam evaporation

机译:电子束蒸发在镍基带上氧化钇稳定的氧化锆缓冲层的织构和表面形态

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摘要

Biaxially textured buffer layers of yttria-stabilized zirconia (YSZ) have been fabricated on metal Ni-based tapes by electron beam evaporation technique. The high deposition rate of the electron beam evaporation presents an advantage in making long coated tape. Various materials including cubic textured Ni; Cu-Ni, and Hastelloy tapes were used as substrates. The grown YSZ films were characterized by X-ray diffraction, scanning electron microscopy, etc. It was found that the YSZ buffer layers were highly c-axis oriented on Ni or Ni-based tapes. The YSZ (111) pole figure revealed a cubic texture. The full width at half maximum of phi-scan of YSZ (111) deposited on Ni, Cu-Ni, and Hastelloy tapes was 15degrees, 14degrees and 20degrees, respectively. The surface of YSZ film is dense. Such YSZ buffer layers are promising for making YBCO coated conductors on metal tapes. (C) 2002 Elsevier Science B.V. All rights reserved. [References: 6]
机译:氧化钇稳定的氧化锆(YSZ)的双轴纹理缓冲层已通过电子束蒸发技术在金属镍基带上制备。电子束蒸发的高沉积速率在制造长的涂布带方面具有优势。各种材料,包括立方织构镍; Cu-Ni和Hastelloy胶带用作基材。通过X射线衍射,扫描电子显微镜等对生长的YSZ膜进行了表征。发现YSZ缓冲层在Ni或Ni基带上高度c轴取向。 YSZ(111)极图显示出立方纹理。沉积在Ni,Cu-Ni和Hastelloy胶带上的YSZ(111)的phi扫描的phi扫描的半峰全宽分别为15度,14度和20度。 YSZ膜的表面致密。这种YSZ缓冲层有望用于在金属带上制造YBCO涂层的导体。 (C)2002 Elsevier Science B.V.保留所有权利。 [参考:6]

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