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Porous Si formation and study of its structural and vibrational properties

机译:多孔硅的形成及其结构和振动性能的研究

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In situ current (I)-(V) voltage studies were carried out to get a better understanding of the mechanism of formation of porous silicon (PS). It is observed that on decreasing the anodization current density below a critical value (similar to 75 mA cm(-2)) the size of the PS crystallites increases while for its values above 75 mA cm(-2) electropolishing occurs. Raman spectroscopic studies show that the sizes of the Si crystallites are small and change from 4.7 to 3.8 nm when the current densities are increased from 20 to 50 mA cm(-2). Transmission electron micrographs show preferential propagation of pores whereas transmission electron diffraction (TED) patterns show typical crystalline Si with the cubic structure. (C) 2002 Elsevier Science B.V. All rights reserved. [References: 26]
机译:进行了原位电流(I)-(V)电压研究,以更好地理解多孔硅(PS)的形成机理。可以观察到,在将阳极氧化电流密度降低至临界值(类似于75 mA cm(-2)以下)以下时,PS微晶的尺寸增加,而对于75 mA cm(-2)以上的值,则会发生电抛光。拉曼光谱研究表明,当电流密度从20 mA增加到50 mA cm(-2)时,硅微晶尺寸很小,并且从4.7 nm改变为3.8 nm。透射电子显微照片显示了孔的优先传播,而透射电子衍射(TED)图显示了具有立方结构的典型晶体Si。 (C)2002 Elsevier Science B.V.保留所有权利。 [参考:26]

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