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Impurity levels in the layered semiconductor p-GaSe doped with group V elements As, Bi and Sb

机译:掺杂有V组元素As,Bi和Sb的层状半导体p-GaSe中的杂质水平

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The radiative and non radiative recombination mechanisms in the As, Sb and Bi-doped GaSe have been investigated on the basis of photoluminescence (PL) and Hall effect measurements. The PL features (at 77 K) related to the impurity levels coming from the As, Sb and Bi atoms are dominated by a broad emission band at about 1.7 eV. From the temperature dependences of the peak energy and PL intensity and the dependence of excitation intensity of peak energy, it was found that the 1.7 eV emission band is due to the transition from the shallow donor level at about 0.08 eV below the conduction band to the deep acceptor. In addition it was found, from the temperature dependence of hole concentration, that a deep acceptor level at about 0.6 eV above the valence band is formed by the doping atoms. It is associated with defects or defect complexes. (c) 2005 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
机译:在光致发光(PL)和霍尔效应测量的基础上,研究了砷,锑和双掺杂砷化镓中的辐射和非辐射复合机理。与来自As,Sb和Bi原子的杂质水平有关的PL特征(在77 K时)以大约1.7 eV的宽发射带为主。从峰值能量和PL强度的温度相关性以及峰值能量的激发强度的相关性,发现1.7 eV发射带是由于在导带以下约0.08 eV处从浅施主能级跃迁到电子。深刻的接受者。另外,根据空穴浓度的温度依赖性,发现由掺杂原子形成了比价带高约0.6eV的深受体能级。它与缺陷或缺陷复合物相关。 (c)2005 WILEY-VCH Verlag GmbH&Co. KGaA,Weinheim。

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