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Sub-gap excited photoluminescence in III-V compound semiconductor heterostructures

机译:III-V族化合物半导体异质结构中的亚间隙激发光致发光

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Photoluminescence (PL) above the excitation energy is observed in a single GaAs-InGaP quantum well (QW) and heterostructure as well as in a InP-GaAs superlattice (SL) and in strained layers. It is shown that sub-gap excitation (1.468 eV) of n-type delta-doped GaAs/GaInP quantum structure leads to an up-converted hot carrier PL emission with energy gains as high as 450 meV. The up-conversion energy in GaAs-InGaP heterostructures is 50 meV which is originated from the GaAs layer. In InP-GaAs SL, the sub-gap excitation results in a hot PL at 1.55 eV. It is also shown that the sub-gap excitation can be used to confirm the changes in band energies of a strained layer. [References: 15]
机译:在单个GaAs-InGaP量子阱(QW)和异质结构以及InP-GaAs超晶格(SL)和应变层中观察到激发能以上的光致发光(PL)。结果表明,n型δ掺杂的GaAs / GaInP量子结构的亚能隙激发(1.468 eV)导致上转换的热载流子PL发射,其能量增益高达450 meV。 GaAs-InGaP异质结构中的上转换能量为50 meV,该能量源自GaAs层。在InP-GaAs SL中,次能隙激发导致1.55 eV的热PL。还显示了子间隙激发可以用于确认应变层的带能的变化。 [参考:15]

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