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首页> 外文期刊>Physica status solidi, B. Basic research >High-temperature Lasing in InGaN/GaN Multiquantum Well Heterostructures
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High-temperature Lasing in InGaN/GaN Multiquantum Well Heterostructures

机译:InGaN / GaN多量子阱异质结构中的高温激光发射

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Lasing, stimulated emission and photoluminescence in InGaN/GaN multiquantum well (MQW) heterostructures were investigated in a wide temperature interval from the liquid nitrogen temperature up to 600 K. Laser action was achieved up to T = 585 K in a heterostructure consisting of ten quantum wells with a width of 10 nm. Laser thresholds at T = 78, 300, and 585 K were 25, 100, and 550 kW/cm~2, respectively. The pulse energy of the InGaN/GaN MQW laser at room temperature was 600 nJ and the average power was 0.6 mW. The characteristic temperature value of T_0 = 164 K was derived from the temperature dependence of the lasing threshold.
机译:在从液氮温度到600 K的宽温度区间内,研究了InGaN / GaN多量子阱(MQW)异质结构中的激光发射,受激发射和光致发光。在由十个量子组成的异质结构中,激光作用达到T = 585 K宽度为10 nm的孔。 T = 78、300和585 K时的激光阈值分别为25、100和550 kW / cm〜2。室温下InGaN / GaN MQW激光器的脉冲能量为600 nJ,平均功率为0.6 mW。 T_0 = 164 K的特征温度值由激射阈值的温度依赖性得出。

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