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首页> 外文期刊>Physica status solidi, B. Basic research >PHYSICAL VAPOR TRANSPORT GROWTH AND PROPERTIES OF SIC MONOCRYSTALS OF 4H POLYTYPE
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PHYSICAL VAPOR TRANSPORT GROWTH AND PROPERTIES OF SIC MONOCRYSTALS OF 4H POLYTYPE

机译:4H型SiC单晶的物理气相传输增长和性质

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The physical vapor transport technique can be employed to fabricate large diameter silicon carbide crystals (up to 50 mm diameter) exhibiting uniform 4H-polytype over the full crystal volume. Crystal growth rate is controlled to first order by temperature conditions and ambient pressure. 4H-polytype uniformity is controlled by polarity of the seed crystal and the growth temperature. 4H-SiC crystals exhibit crystalline defects mainly in the form of dislocations with densities in the 10(4) cm(-2) range and micropipe defects, the latter having densities as low as 10 cm(-2) in best crystals. Electrical conductivity in 4H-SiC bulk crystals ranges from <10(-2) Omega cm, n-type, to insulating (>10(15) Omega cm) at room temperature. [References: 33]
机译:可以采用物理气相传输技术来制造大直径的碳化硅晶体(最大直径为50 mm),在整个晶体体积内显示出均匀的4H多型。通过温度条件和环境压力将晶体生长速率控制在一级。 4H-多型均匀性受晶种的极性和生长温度控制。 4H-SiC晶体主要以位错的形式表现出晶体缺陷,其密度在10(4)cm(-2)范围内,而微管缺陷在最佳晶体中的密度低至10 cm(-2)。 4H-SiC块状晶体在室温下的电导率范围从n型<10(-2)Ω至绝缘(> 10(15)Ω)。 [参考:33]

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