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Improvement in size distributionbasic solid state physics and optical properties of InAs/GaAs QDs by post growth thermal treatment

机译:通过生长后热处理改善InAs / GaAs QDs的尺寸分布基本固态物理特性和光学性能

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We investigated the effect of rapid thermal annealing fromto'050-''r oh stacked InAs/GaAs quantum dots (QDs)covered with GaAs"and Inol9Ga081As layers. Large blue-shiftj^oSltionsiear1y 380 meV (1187 ntn to 870 nrn)in iiGaAs capped samples together withimpnwement the,Photoltniiinescence integrated intensity ofMore than five times, The strong narrowing of the photolumi-nes in both GaAs (as narrow as 8 meV) andlnQaAs capped samples show an improvement of the size distribution of the Qns. In addition, a significant reduction ofthe energy spacing (AE2_1) between ground state and first ex-cited state emissions were found in both GaAs and InGaAscapped quantum dots' due to interface inter-diffusion inducedby thermal treatment. The excited state filling experiments forInGaAs capped sample annealed at 950 °C exhibits quantumwell like behavior where as, the GaAs capped sample shows ashoulder in high energy side might be due to first excitedstate of QDs.
机译:我们研究了快速热退火对由GaAs和Inol9Ga081As层覆盖的'050-'r堆叠的InAs / GaAs量子点(QDs)进行快速退火的影响。iiGaAs中大的蓝移现象380 meV(1187 ntn至870 nrn)。封端样品的光致发光综合强度提高了五倍以上,GaAs(窄至8 meV)和lnQaAs封端样品中光致发光二极管的强烈变窄显示了Qns尺寸分布的改善。由于热处理引起的界面相互扩散,GaAs和InGaA封顶的量子点均发现基态与第一激发态发射能之间的能量间隔(AE2_1)明显减小,退火温度为950°的InGaAs封顶样品的激发态填充实验C表现出类似量子阱的行为,其中,盖有GaAs的样品显示高能侧的积灰可能是由于QD的第一个激发态引起的。

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