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Texture mechanisms and microstructure of biaxial thin films grown by oblique angle deposition

机译:斜角沉积生长双轴薄膜的织构机理和微观结构

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In order to understand the texture formation mechanism in thin films grown under oblique angle deposition (OAD), TiAlN films were deposited at room temperature (RT) under various incident angles. We show that both in-plane and out-of-plane crystallographic orientations respond strongly to the deposition angle. For α=0°, the pole figures show a (111) and (200) mixed out-of-plane orientation with random in-plane alignment. In contrast, under OAD, inclined textures are observed with the (111) direction moving toward the incident flux direction and the (200) moving away, showing substantial in-plane alignment. This observation suggests that TiAlN crystals prefer to grow with the (200) direction perpendicular to the substrate while maintaining the minimization of the surface free energy by maximizing the (111) surface area toward the incident flux. The in-plane texture, which is randomly oriented at normal incidence, gives rise to two preferred orientations under oblique angles - one along the direction of flux and other away from the deposition source. The biaxial texture results from a competition among texture mechanism related to surface mobilities of adatoms, geometrical and directional effects. The surface and cross-section of the films were observed by scanning electron microscopy (SEM). OAD films develop a kind of smooth tiles of a roof structure, with no faceted crystallites. The columns of these films were tilted toward the direction of incident flux. The dependence of (111) texture tilt angle and column angle β on the incidence flux angle α is evaluated using four well-known models. Transmission electron microscopy (TEM) study reveals a voided, intercolumnar structure with oblique growth toward the flux direction. The selected area diffraction pattern (SAED) pattern supports the pole figure observations. Measurements of the nanoindentation test were performed in order to discuss the change of mechanical properties as a function of incident flux angle.
机译:为了理解倾斜角沉积(OAD)下生长的薄膜中的纹理形成机理,在室温(RT)下以各种入射角沉积TiAlN膜。我们表明,平面内和平面外的晶体学取向都强烈响应沉积角。对于α= 0°,极坐标图显示(111)和(200)混合的面外取向以及随机的面内对齐。相反,在OAD下,观察到倾斜的纹理,其中(111)方向朝着入射通量方向移动,而(200)则向远离方向移动,显示出实质上的面内对齐。该观察结果表明,TiAlN晶体倾向于沿垂直于衬底的(200)方向生长,同时通过使朝向入射通量的(111)表面积最大化来保持表面自由能最小。在法向入射时随机定向的面内纹理在倾斜角度下产生了两个优选的方向-一个沿磁通方向,另一个远离沉积源。双轴织构是由与吸附原子的表面迁移率,几何和方向效应有关的织构机制之间的竞争产生的。通过扫描电子显微镜(SEM)观察膜的表面和横截面。 OAD薄膜开发出一种具有屋顶结构且没有多面微晶的光滑瓷砖。这些膜的列向入射通量方向倾斜。使用四个众所周知的模型来评估(111)纹理倾斜角和列角β对入射通量角α的依赖性。透射电子显微镜(TEM)研究发现,有空隙的柱间结构向通量方向倾斜生长。选定的区域衍射图(SAED)图支持极图观测。为了讨论机械性能随入射通量角的变化,进行了纳米压痕测试。

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