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Electronic states in hydrogenated microcrystalline silicon

机译:氢化微晶硅中的电子态

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Electronic states in the mixed-phase material microcrystalline silicon prepared by plasma-enhanced chemical vapour deposition were investigated by continuous-wave and time-resolved electron spin resonance techniques in thermal equilibrium and under illumination. Samples prepared with various plasma-excitation frequencies nu(ex) and various process gas mixtures (which leads to differences in the crystalline volume fractions and grain sizes) and samples with different p-and n-type doping levels were studied. Three main electron spin resonance contributions were found and attributed to dangling bonds in different structural environments in the material and to conduction electrons. The g values of the dangling bends are shifted with respect to the g value of the dangling bond in amorphous silicon. The dangling-bond spin density remains largely unchanged over a wide range of plasma excitation frequencies but increases at the highest nu(ex) and increases also at high silane gas concentrations when amorphous growth conditions are reached. Upon doping, giving a change in the dark conductivity of five orders of magnitude, the dangling-bond spin density varies by a factor of only four and decreases significantly only for the highest p doping levels. The intensity of the conduction-electron resonance is closely related to the dark conductivity of the material. From light-induced electron spin resonance, it is concluded that photoexcited charge-carrier pairs become separated into different regions of the material. This spatial separation results in very long recombination times. Pulsed electron spin resonance measurements show two distinct spin-lattice relaxation times T-1 in the material; the T-1 of dangling bonds is very similar to the corresponding relaxation time in amorphous silicon, and the T-1 of conduction electrons is several orders of magnitude less than the relaxation time of the dangling bonds. The electron spin resonance results are related to results from electronic conductivity and structural investigations. A qualitative band diagram is used for discussion. [References: 38]
机译:通过连续波和时间分辨电子自旋共振技术在热平衡和光照下研究了通过等离子体增强化学气相沉积制备的混合相材料微晶硅中的电子态。研究了使用各种等离子体激发频率nu(ex)和各种工艺气体混合物(导致晶体体积分数和晶粒尺寸的差异)制备的样品以及具有不同p型和n型掺杂水平的样品。发现了三个主要的电子自旋共振贡献,这归因于材料中不同结构环境中的悬空键和传导电子。悬空弯曲的g值相对于非晶硅中悬空键的g值移动。悬空键的自旋密度在很大的等离子体激发频率范围内基本保持不变,但当达到无定形生长条件时,在最高nu(ex)时增加,并且在高硅烷气体浓度时也增加。掺杂后,使暗电导率变化了五个数量级,悬空键的自旋密度仅变化了四倍,并且仅在最高的p掺杂水平时才显着降低。传导电子共振的强度与材料的暗电导率密切相关。从光诱导的电子自旋共振,可以得出结论,光激发的电荷-载流子对被分成材料的不同区域。这种空间分离导致非常长的重组时间。脉冲电子自旋共振测量结果表明材料中两个不同的自旋晶格弛豫时间T-1。悬空键的T-1与非晶硅中相应的弛豫时间非常相似,并且导电电子的T-1比悬空键的弛豫时间小几个数量级。电子自旋共振结果与电子电导率和结构研究的结果有关。定性能带图用于讨论。 [参考:38]

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