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首页> 外文期刊>Surface science spectra >Fuchs-Kliewer HREEL Phonon Spectrum of Single Crystal NiO(100) and of Ni(100)/NiO(111) and Ni(100)/NiO(100) Thin Films
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Fuchs-Kliewer HREEL Phonon Spectrum of Single Crystal NiO(100) and of Ni(100)/NiO(111) and Ni(100)/NiO(100) Thin Films

机译:单晶NiO(100)以及Ni(100)/ NiO(111)和Ni(100)/ NiO(100)薄膜的Fuchs-Kliewer HREEL声子谱

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摘要

The high resolution electron energy loss spectrum (HREELS) of an ionic material is generally dominated by inelastic scattering of the electron with Fuchs-Kliewer phonon modes of the lattice surface. The phonon motion, in which the cations and anions vibrate out of phase to each other, yields a substantial dipole moment and thus an intense phonon spectrum along the specular scattering direction. In NiO, the high symmetry of its fcc rocksalt structure produces a single fundamental Fuchs-Kliewer phonon mode. However, the large cross section for phonon excitation results in multiple scattering events and thus a series of losses at integral multiples of the fundamental phonon energy. We report Fuchs-Kliewer phonon spectra for single crystal NiO(100) and for thin films of nickel oxide grown on Ni(100)single crystal substrates. The NiO(100) orientation is nonpolar, with interpenetrating square arrays of cations and anions, and is the thermodynamically most stable nickel oxide surface. The entire phonon spectrum of the thin film is considerably less than that of the NiO(100) single crystal substrate due to the damping effect of the underlying Ni(100) metal. NiO(100) is produced for Ni(100) substrate temperatures <=300 K under comparable oxygen partial pressures. The NiO(100) orientation is metastable and grows to a limiting thickness of three layers. With a single loss energy of 69.6 meV, the Ni(100)/NiO(1111) Fuchs-Kliewer phonon loss is equal to that of NiO(100) but the multiple losses are more poorly developed despite the comparable thicknesses of the two thin films. The poorer definition of the phonon spectrum is believed to result from a greater amount of disorder in the metastable NiO(111) thin film.
机译:离子材料的高分辨率电子能量损失谱(HREELS)通常由晶格表面Fuchs-Kliewer声子模的电子非弹性散射决定。阳离子和阴离子彼此异相振动的声子运动会产生很大的偶极矩,从而沿着镜面散射方向产生很强的声子谱。在NiO中,其fcc岩盐结构的高度对称性产生单一的基本Fuchs-Kliewer声子模。然而,用于声子激发的大横截面导致多次散射事件,并因此在基本声子能量的整数倍处产生一系列损耗。我们报告单晶体NiO(100)和生长在Ni(100)单晶衬底上的氧化镍薄膜的Fuchs-Kliewer声子光谱。 NiO(100)方向是非极性的,具有互穿的阳离子和阴离子正方形阵列,并且是热力学上最稳定的氧化镍表面。由于下面的Ni(100)金属的阻尼作用,薄膜的整个声子谱大大小于NiO(100)单晶衬底的声子谱。在可比较的氧气分压下,对于Ni(100)衬底温度<= 300 K,将生成NiO(100)。 NiO(100)取向是亚稳态的,并生长到三层的极限厚度。 Ni(100)/ NiO(1111)Fuchs-Kliewer声子损耗的单损失能量为69.6 meV,与NiO(100)相等,但尽管两个薄膜的厚度相当,但多重损失的产生更差。声子谱的较差定义被认为是由于亚稳NiO(111)薄膜中存在大量无序所致。

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