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Enhancement in UV emission and band gap by Fe doping in ZnO thin films

机译:Fe掺杂在ZnO薄膜中增强UV发射和带隙

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摘要

Enhancement of the optical band gap of ZnO from 3.14 to 3.29 eV has been obtained using Fe dopant. Undoped and doped ZnO films are deposited by sol?gel spin coating. XRD patterns indicate polycrystalline nature and hexagonal wurtzite structure of Zn_(1–x) Fe_xO films. EDX analysis confirms the presence of iron dopant. The photoluminescence spectra show an ultraviolet emission peak at 398 nm (NBE emission) and defect emission peak at 485 nm. Intensity of the NBE emission is much higher for the doped samples with its ratio to defect emission intensity highest for 2 at. %doping. The NBE emission shifts to higher energy with increasing dopant concentration in a manner similar to that exhibited by the band gap. Surface morphology has been studied using FESEM.
机译:使用Fe掺杂剂已经将ZnO的光学带隙从3.14eV提高到3.29eV。未掺杂和掺杂的ZnO薄膜通过溶胶-凝胶旋涂沉积。 XRD图谱表明Zn_(1–x)Fe_xO薄膜具有多晶性质和六方纤锌矿结构。 EDX分析证实了铁掺杂剂的存在。光致发光光谱在398nm处显示出紫外线发射峰(NBE发射),而在485nm处显示出缺陷发射峰。掺杂样品的NBE发射强度要高得多,其与缺陷发射强度的比率最高为2 at。 %掺杂。 NBE发射会随着掺杂物浓度的增加而转移到更高的能量,其方式类似于带隙。已经使用FESEM研究了表面形态。

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