Electrochemical Performance of Vanadium Oxide Coatings Grown using Atmospheric Pressure CVD

摘要

The growth of vanadium dioxide is carried out using chemical vapor deposition with N-2 flow rates of 1, 1.4 and 2.2 L min(-1) through the vanadium precursor bubbler. The presence of both monoclinic and metastable vanadium dioxide phases with the co-existence of nanocrystallites and outgrowths on the coating surface is observed for the 1 L min(-1). Additionally, the electrochemical performance for this sample is enhanced and the specific discharge capacity was the highest presenting capacitance retention of 97% after 500 scans. Finally, it is found that the diffusion of Li+ through the cathode/electrolyte interface is easier enhancing its capacitive performance.