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首页> 外文期刊>Soldering & Surface Mount Technology >Intermetallic compound formation and diffusion path evolution in eutectic tin-lead flip chip solder bumps after aging
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Intermetallic compound formation and diffusion path evolution in eutectic tin-lead flip chip solder bumps after aging

机译:老化后共晶锡铅倒装焊锡凸块中金属间化合物的形成和扩散路径的演变

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摘要

Purpose - In the flip-chip technology (FCT) used in current microelectronic packages, a Ni-based under-bump metallurgy (UBM) is widely used due to its slow reaction rate with Sn. In this study, solders joints of eutectic Pb-Sn with a Ni UBM were employed to investigate the intermetallic compound (IMC) formation after aging at 150℃ for various periods of time. Design/methodology/approach - The compositions and elemental re-distribution in the IMC formed due to the interfacial reaction between the Ni/ Cu UBM and eutectic Sn-Pb solders were evaluated with an electron probe microanalyzer. The interfacial morphologies were revealed with the aid of a field-emission scanning electron microscope through a special etching technique. Findings - At the centre of the chip side, two IMCs were found between the solder and Ni metallization. The scalloped-like IMC was determined to be (Cu, Ni){sub}6Sn{sub}5, while the nodule-like IMC was (Ni,Cu){sub}3Sn{sub}4. However, at the edge of the chip side, three IMCs were revealed. The scalloped-like IMC was (Cu{sub}(1-y), Ni{sub}y){sub}6Sn{sub}5, the nodule-like IMC was (Ni{sub}(1-x), Cu{sub}x){sub}3Sn{sub}4, and the layer-type IMC was (Cu{sub}(1-z), Ni{sub}z){sub}3Sn. Originality/value - On the basis of the elemental distributions from the quantitative analysis of the IMC and the related phase transitions during the IMC formation, two distinct diffusion paths are proposed to illustrate the interfacial reaction and phase transformation between IMCs and solder in Sn-Pb joints aged at 150℃. These diffusion paths demonstrated two kinds of phase equilibrium, including (Cu{sub}(1-z), Ni{sub}z){sub}3Sn/(Cu{sub}(1-y), Ni{sub}y){sub}6Sn{sub}5/solder and (Ni{sub}(1-x),Cu{sub}x){sub}3Sn{sub}4)/(Cu{sub}(1-y)Ni{sub}y){sub}6)Sn{sub}5/solder.
机译:目的-在当前微电子封装中使用的倒装芯片技术(FCT)中,由于镍基凸块冶金(UBM)与锡的反应速度较慢,因此被广泛使用。在这项研究中,共晶Pb-Sn与Ni UBM的焊点被用来研究在150℃下老化不同时间后金属间化合物(IMC)的形成。设计/方法/方法-使用电子探针显微分析仪评估了由于Ni / Cu UBM与共晶Sn-Pb焊料之间的界面反应而形成的IMC中的成分和元素再分布。借助于场发射扫描电子显微镜,通过特殊的蚀刻技术揭示了界面形态。发现-在芯片一侧的中心,在焊料和Ni金属化层之间发现了两个IMC。扇贝状IMC确定为(Cu,Ni){sub} 6Sn {sub} 5,而结节状IMC确定为(Ni,Cu){sub} 3Sn {sub} 4。但是,在芯片一侧的边缘,发现了三个IMC。扇贝状IMC为(Cu {sub}(1-y),Ni {sub} y){sub} 6Sn {sub} 5,结节状IMC为(Ni {sub}(1-x),Cu {sub} x){sub} 3Sn {sub} 4,并且层型IMC为(Cu {sub}(1-z),Ni {sub} z){sub} 3Sn。原创性/价值-基于对IMC进行定量分析的元素分布以及在IMC形成过程中相关的相变,提出了两种不同的扩散路径,以说明IMC与锡铅中焊料之间的界面反应和相变接头在150℃时效。这些扩散路径表现出两种相平衡,包括(Cu {sub}(1-z),Ni {sub} z){sub} 3Sn /(Cu {sub}(1-y),Ni {sub} y) {sub} 6Sn {sub} 5 /焊料和(Ni {sub}(1-x),Cu {sub} x){sub} 3Sn {sub} 4)/(Cu {sub}(1-y)Ni { sub} y){sub} 6)Sn {sub} 5 /焊锡。

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