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Thermal and Electrical Conduction in Ultrathin Metallic Films: 7 nm down to Sub-Nanometer Thickness

机译:超薄金属膜中的热和电导率:7 nm至亚纳米厚度

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For ultrathin metallic films (e.g., less than 5 nm), no knowledge is yet available on how electron scattering at surface and grain boundaries reduces the electrical and thermal transport. The thermal and electrical conduction of metallic films is characterized down to 0.6 nm average thickness. The electrical and thermal conductivities of 0.6 nm Ir film are reduced by 82% and 50% from the respective bulk values. The Lorenz number is measured as 7.08 × 10 ~(? 8) W Ω K ~(? 2), almost a twofold increase of the bulk value. The Mayadas-Shatzkes model is used to interpret the experimental results and reveals very strong electron reflection (> 90%) at grain boundaries.
机译:对于超薄金属膜(例如,小于5nm),尚无关于在表面和晶界处的电子散射如何减少电和热传递的知识。金属膜的导热和导电特性可低至平均厚度0.6 nm。 0.6 nm Ir薄膜的电导率和热导率分别比各自的体积值降低了82%和50%。洛伦兹数的测量值为7.08×10〜(?8)WΩK〜(?2),几乎是体积值的两倍。 Mayadas-Shatzkes模型用于解释实验结果,并揭示了在晶界处非常强的电子反射(> 90%)。

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