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Advanced Sputtering Technologies and Targets for Oxide Semiconductor TFT

机译:氧化物半导体TFT的先进溅射技术和靶材

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摘要

Recently, oxide semiconductors have been coming under the spotlights as a replacement of the amorphous silicon (a-Si) and it is going to be taken into mass production of Active Matrix-Liquid Crystal Displays (AM-LCD). However, innovation or further optimization has still been required in film deposition techniques and also in the arrangement of sputtering targets for high definition Active Matrix-Organic Light Emitting Diodes (AM-OLED). In this report, ULVAC addresses our analysis and approaches for those issues.
机译:近来,氧化物半导体已经成为非晶硅(a-Si)的替代品,并将被投入批量生产有源矩阵液晶显示器(AM-LCD)。然而,在膜沉积技术中以及在用于高清晰度有源矩阵-有机发光二极管(AM-OLED)的溅射靶的布置中,仍需要创新或进一步的优化。在本报告中,ULVAC解决了我们针对这些问题的分析和方法。

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