Oxide semiconductor film, thin film transistor, oxide sintered body for sputtering target, sputtering target and electronic equipment

摘要

Atomic ratios of In, Ga and Sn are as follows: 0.01 ≦ Ga / (In + Ga + Sn) ≦ 0.30 (1) 0.01 ≦ Sn / (In + Ga + Sn) ≦ 0.40 (2) 0.55 .Ltoreq.In / (In + Ga + Sn) .ltoreq.0.98 (3) and the rare earth element X in the following atomic ratio 0.03.ltoreq.X / (In + Ga + Sn + X) .ltoreq.0.25 (4) Oxide semiconductor film.