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Fabrication of Tin Oxide Thin Film Transistors by RF Magnetron Sputtering Using Sn/SnO Composite Target

机译：使用Sn / Sno复合靶通过RF磁控溅射制备氧化锡薄膜晶体管

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Cheol Kim;
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1. Fabrication of Tin Oxide Thin Film Transistors by RF Magnetron Sputtering Using Sn/SnO Composite Target [J] . Cheol Kim, Sarah Eunkyung Kim Advances in Materials . 2018,第3期

机译：Sn / SnO复合靶材的射频磁控溅射制备氧化锡薄膜晶体管
2. Preparation of p-type SnO thin films and transistors by sputtering with robust Sn/SnO2 mixed target in hydrogen-containing atmosphere [J] . Hsu Po-Ching, Tsai Shiao-Po, Chang Ching-Hsiang, Thin Solid Films . 2015,第juna30期

机译：含氢气氛中强健的Sn / SnO2混合靶溅射制备p型SnO薄膜和晶体管
3. Transparent conducting oxide thin films of Cd2SnO4 prepared by RF magnetron co-sputtering of the constituent binary oxides [J] . Mamazza R, Morel DL, Ferekides CS Thin Solid Films . 2005,第1a2期

机译：通过射频磁控共溅射组成的二元氧化物制备的Cd2SnO4透明导电氧化物薄膜
4. Fabrication and Characterization of p-type SnO Thin-Film Transistors by Reactive DC Magnetron Sputtering [C] . Chien-Yie Tsay, Ming-Chien Lin, Fong-Yi Chang, International Workshop on Active-Matrix Flatpanel Displays and Devices . 2019

机译：反应型直流磁控溅射制备p型SnO薄膜晶体管及其表征
5. Reactive high power impulse magnetron sputtering of zinc oxide for thin film transistor applications [D] . Reed, Amber Nicole 2015

机译：用于薄膜晶体管应用的氧化锌的反应性大功率脉冲磁控溅射
6. Influence of Oxygen Concentration on the Performance of Ultra-Thin RF Magnetron Sputter Deposited Indium Tin Oxide Films as a Top Electrode for Photovoltaic Devices [O] . Jephias Gwamuri, Murugesan Marikkannan, Jeyanthinath Mayandi, 2016

机译：氧浓度对超薄射频磁控溅射沉积铟锡氧化物薄膜作为光伏器件上电极的性能的影响
7. Fabrication of transparent conducting amorphous Zn–Sn–In–O thin films by direct current magnetron sputtering [O] . Ow-Yang Cleva W., Yeom Hyo-young, Paine David C. 2008

机译：直流磁控溅射制备透明导电非晶Zn-Sn-In-O薄膜

Fabrication of Tin Oxide Thin Film Transistors by RF Magnetron Sputtering Using Sn/SnO Composite Target

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