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Mechanism of dislocation-governed charge transport in Schottky diodes based on gallium nitride

机译:基于氮化镓的肖特基二极管中位错控制的电荷传输机理

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摘要

A mechanism of charge transport in Au-TiBx-n-GaN Schottky diodes with a space charge region considerably exceeding the de Broglie wavelength in GaN is studied. Analysis of temperature dependences of current-voltage (I-V) characteristics of forward-biased Schottky barriers showed that, in the temperature range 80-380 K, the charge transport is performed by tunneling along dislocations intersecting the space charge region. Estimation of dislocation density rho by the I-V characteristics, in accordance with a model of tunneling along the dislocation line, gives the value rho approximate to 1.7 x 10(7) cm(-2), which is close in magnitude to the dislocation density measured by X-ray diffractometry.
机译:研究了空间电荷区大大超过GaN中的德布罗意波长的Au-TiBx-n-GaN肖特基二极管中的电荷传输机制。对正向肖特基势垒的电流-电压(I-V)特性的温度依赖性分析表明,在80-380 K的温度范围内,通过沿着与空间电荷区域相交的位错进行隧穿来进行电荷传输。根据沿着位错线隧穿的模型,通过IV特性估算位错密度rho得出的值rho大约为1.7 x 10(7)cm(-2),其大小与测得的位错密度接近通过X射线衍射法。

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