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A study of highly c-axis oriented AIN films for diamond-based surface acoustic wave devices: Bulk structure and surface morphology

机译:金刚石基表面声波器件中高c轴取向AIN膜的研究:整体结构和表面形态

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A systematic study on the optimisation of the sputtering deposition technique for AlN films on diamond substrates is presented. The dependence of the film quality has been analysed versus deposition temperature, for diamond substrates pre-treated with a reactive ion etching (RIE) process for a time duration between 0 and 4 min. These two parameters were found to be critical to obtain highly textured films with the c-axis perpendicular to the substrate surface and with a low surface roughness, as required by surface acoustic wave (SAW) applications. In particular, the RIE time was individuated to be crucial in defining the substrate-morphological quality, influencing, in turn, the films structure. The structural characterization of the films was performed by energy dispersive X-ray diffraction (EDXD) analysis and supported by further energy dispersive X-ray reflectometry (EDXR) morphological measurements. Indeed these non-conventional techniques, making use of a non-monochromatized X-ray radiation, are particularly suited when this kind of measurements are required. (c) 2007 Elsevier B.V. All rights reserved.
机译:提出了一种优化金刚石基底上AlN膜溅射沉积技术的系统研究。对于使用反应离子刻蚀(RIE)工艺预处理0至4分钟之间的时间的金刚石基材,已经分析了膜质量与沉积温度的关系。发现这两个参数对于获得c表面垂直于基材表面且表面粗糙度低的高纹理薄膜至关重要,这是表面声波(SAW)应用所要求的。尤其是,RIE时间被认为是确定底物形貌质量的关键,继而影响膜的结构。薄膜的结构表征是通过能量色散X射线衍射(EDXD)分析进行的,并得到了进一步的能量色散X射线反射法(EDXR)形态学测量的支持。实际上,当需要进行此类测量时,利用非单色X射线辐射的这些非常规技术尤其适用。 (c)2007 Elsevier B.V.保留所有权利。

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