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High-Quality C-Axis Oriented HTSC Films for Microwave Devices

机译:用于微波器件的高质量C轴取向HTsC薄膜

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C-axis oriented HTSC films were grown by LPE on various substrates. The conditions for improving the surface flatness were systematically studied. For the achievement of interstep distances yo approx. 10 micrometers between monosteps of 12 Angstroms, as required for Tunnel devices, following requirements were estimated: undercooling delta-T = 0.17K, misfit

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