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首页> 外文期刊>Sensors and Actuators, A. Physical >{100}-textured, piezoelectric Pb(Zr-x Ti1-x)O-3 thin films for MEMS: integration, deposition and properties
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{100}-textured, piezoelectric Pb(Zr-x Ti1-x)O-3 thin films for MEMS: integration, deposition and properties

机译:用于MEMS的{100}纹理压电Pb(Zr-x Ti1-x)O-3薄膜:集成,沉积和性能

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摘要

Pb(Zr-x, Ti1-x)O-3 (PZT) piezoelectric thin films are of major interest in MEMS technology for their ability to provide electro-mechanical coupling. In this work, the effective transverse piezoelectric coefficient e(31,f) of sol-gel processed films was investigated as a function of composition, film texture and film thickness. Dense, textured and crack-free PZT films have been obtained on silicon substrates up to a thickness of 4 mum. Crystallization anneals have been performed for every 0.25 mum. Nucleation on the previous perovskite layer combined with directional growth leads to a gradient of the compositional parameter x of +/-20% (at x = 0.53 average composition). Best properties have been achieved with {100}-textured film of x = 0.53 composition. Large remanent e(31,f) values of -11 to -12 C/m(2) have been obtained in the whole thickness range of 1-4 mum. These values are superior to values of undoped bulk ceramics, but smaller than in current, optimized (doped) bulk PZT. (C) 2003 Elsevier Science B.V. All rights reserved. [References: 40]
机译:Pb(Zr-x,Ti1-x)O-3(PZT)压电薄膜因其提供机电耦合的能力而成为MEMS技术的主要关注点。在这项工作中,研究了溶胶-凝胶处理的薄膜的有效横向压电系数e(31,f)与成分,薄膜质地和薄膜厚度的关系。已经在硅基板上获得了厚度高达4微米的致密,纹理化和无裂纹的PZT膜。每0.25毫米进行一次结晶退火。在先前的钙钛矿层上的成核与定向生长相结合,导致组成参数x的梯度为+/- 20%(在x = 0.53平均组成下)。用x = 0.53组成的{100}织构化薄膜可获得最佳性能。在1-4微米的整个厚度范围内,可以获得-11至-12 C / m(2)的较大剩余e(31,f)值。这些值优于未掺杂的块状陶瓷,但小于当前的优化(掺杂)块状PZT。 (C)2003 Elsevier Science B.V.保留所有权利。 [参考:40]

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