首页> 外文期刊>Ferroelectrics: Letters Section >Piezoelectric and Dielectric Properties of Sputter Deposited (111), (100) and Random-Textured Pb(Zr_xTi_(1-x))O_3 (PZT) Thin Films
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Piezoelectric and Dielectric Properties of Sputter Deposited (111), (100) and Random-Textured Pb(Zr_xTi_(1-x))O_3 (PZT) Thin Films

机译:溅射沉积(111),(100)和随机纹理的Pb(Zr_xTi_(1-x))O_3(PZT)薄膜的压电和介电性能

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摘要

Highly textured PZT (111), PZT(001/100) andrandom PZT films have been grown on Pt and RuO_2 bottomelectrodes by means of an in-situ, multimagnetron reactivesputtering process with three metal targets (Pb, Zr, Ti). Theorientation was varied with the bottom electrode/PZT initialinterlayer deposition conditions. Series of 300nm thick films withvarying composition x have been prepared. The Ti and Zr ratio waschanged by adjusting the powers of the corresponding targets. Thelead content was self stabilized by the process at the depositiontemperature of 570 deg C. Polarization, dielectric andpiezoelectric properties were studied. Coercive field, built-inelectric field and unswitchable polarization for Ti-richcompositions have been determined by polarisation hysteresis loops.
机译:借助于具有三种金属靶(Pb,Zr,Ti)的原位多磁控反应溅射工艺,在Pt和RuO_2底部电极上生长了高织构化的PZT(111),PZT(001/100)和无规PZT膜。取向随底部电极/ PZT初始层间沉积条件而变化。已经制备了一系列具有不同组成x的300nm厚的膜。通过调节相应靶的功率来改变Ti和Zr比。铅的含量在570℃的沉积温度下通过该过程自稳定。研究了极化,介电和压电特性。富钛组成的矫顽场,内置电场和不可切换的极化已通过极化磁滞回线确定。

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