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Orientation and composition dependence of piezoelectric dielectric properties of sputtered Pb(Zr{sub}x,Ti{sub}(1-x)O{sub}3 thin films

机译:溅射PB(Zr {Sub} X,Ti {Sub}(1-x)O {Sub} 3薄膜压电介电性质的取向和组成依赖性

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In-situ, reactively sputter deposited 300 nm thick Pb(Zr{sub}x,Ti(1-x))O{sub}3 films on Pt/Si based substrates are investigated as a function of composition and texture. (111) PZT is grown on a (111) oriented Pt bottom electrode covered with a very thin TiG{sub}9 film. Highly {100} oriented PZT is grown on Pt (111) by means of a 10 nm thick PbTiO{sub}3 seed layer. Pronounced deviations from known bulk PZT behavior are observed for the (111) texture. Maximum of d{sub}33 and ε are shifted to 40/60 and 45/55 compositions, respectively. (100) textured films exhibit a higher d{sub}33. 1.3μm (100) thick films attain the predicted d{sub}33 value of clamped bulk ceramics. Coercive fields and voltage offsets increase strongly with increasing Ti content. In parallel, the as-grown polarization increases. Polarization switching is not possible for x≤0.1. Post-anneals in O{sub}2 and hot poling show that oxygen vacancies play an important role in this phenomenon. Ti-rich (100) oriented films exhibit very high and stable pyroelectric and piezoelectric coefficients without poling treatments.
机译:原位,作为组合物和质地的函数,研究了基于Pt / Si基底上的300nm厚的Pb(Zr {sub} x,Ti(1-x))o {sub} 3膜的反积溅溅射。 (111)PZT在覆盖有非常薄的TIG {SUB} 9膜的覆盖物上的(111)定向的PT底部电极上。通过10nm厚的PBTIO {Sub} 3种子层,高度{100}定向的PZT在Pt(111)上生长。观察到(111)纹理观察到来自已知散装PZT行为的发音偏差。 D {Sub} 33和ε分别移位至40/60和45/55组合物。 (100)纹理薄膜表现出更高的D {SUB} 33。 1.3μm(100)厚膜达到夹紧散装陶瓷的预测D {Sub} 33值。强制性字段和电压偏移随着TI含量的增加而强烈增加。并行地,增生极化增加。 X≤0.1不可能实现极化切换。 o {sub} 2和热杆后退火表明,氧空缺在这种现象中发挥着重要作用。富含Ti的(100)定向薄膜在没有抛配处理的情况下表现出非常高且稳定的热电系数和压电系数。

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