Electro-deposition of Fe-Tb-O films with ac currents for use in high frequency micromagnetic devices

摘要

Electro-deposition of Fe-Tb-O films was attempted using ac currents with low frequency. The film composition, especially Tb content of films, was found to be sensitive to the concentration of complex agent, KNaC_(4)H_(4)O_(6): when KNaC_(4)H_(4)O_(6)=283.47 mM, plated films with very high Tb content reaching 29 at.% were obtained, in spite of the difficulty in electro-deposition of Tb owing to its very low catalytic activity. Coercivity H_(c) and squareness ratio M_(r)/M_(S) of films varied considerably depending strongly on the intensity of ac current i: when i=0.67 A/dm~(2), films with relatively soft magnetic properties of H_(c)=29O e and M_(r)/M_(s)=0.93 were realized.