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Single-crystalline 4H-SiC micro cantilevers with a high quality factor

机译:高品质因数的单晶4H-SiC微悬臂梁

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摘要

Single-crystalline 4H-SiC micro cantilevers were fabricated by doping-type selective electrochemical etching of 4H-SiC. Using this method, n-type 4H-SiC cantilevers were fabricated on a p-type 4H-SiC substrate, and resonance characteristics of the fabricated 4H-SiC cantilevers were investigated under a vacuum condition. The resonant frequencies agreed very well with the results of numerical simulations. The maximum quality factor in first-mode resonance of the 4H-SiC cantilevers was 230,000. This is 10 times higher than the quality factor of conventional 3C-SiC cantilevers fabricated on an Si substrate.
机译:通过对4H-SiC进行掺杂型选择性电化学刻蚀,制备了单晶4H-SiC微悬臂梁。使用这种方法,在p型4H-SiC衬底上制作了n型4H-SiC悬臂,并在真空条件下研究了制作的4H-SiC悬臂的共振特性。共振频率与数值模拟的结果非常吻合。 4H-SiC悬臂梁的第一模式共振的最大品质因数为230,000。这是在Si基板上制造的传统3C-SiC悬臂的质量系数的10倍。

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