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首页> 外文期刊>Russian journal of electrochemistry >Electrochemical Behavior of Copper in 1-Butyl-3-Methylimidazolium Bromide-Copper(II) Bromide Binary Ionic Liquid
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Electrochemical Behavior of Copper in 1-Butyl-3-Methylimidazolium Bromide-Copper(II) Bromide Binary Ionic Liquid

机译:铜在1-丁基-3-甲基咪唑鎓溴化物-铜(II)溴化物二元离子液体中的电化学行为

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摘要

The methods of potentiometry, voltammetry, and gravimetry are used to study the electrochemical behavior of copper in the BMImBr-CuBr_2 ionic liquid (0-30.5 mol % CuBr_2). It is shown that electrochemical reduction of copper(II) occurs irreversibly, in two one-electron stages (transfer coefficient α of the cathodic process are 0.58 and 0.46, accordingly, for the first and second stages). Diffusion coefficients of copper-containing ions D_(Cu(II)) at 60°C are 1.3 × 10~(-7) and 1.6 × 10~(-7) cm~2 s~(-1) in melts with the CuBr_2 concentration of 0.1 and 1.5 mol kg~(-1) of BMImBr, accordingly. High (up to 98%) deposition efficiency and high-quality copper deposit can be obtained in the potential range of -2.0 to -1.8 V (vs. a platinum quasireference electrode). It is found that the copper corrosion rate grows at an increase in the CuBr_2 concentration in the binary melt and is comparable with that in aqueous solutions of H_2SO_4-CuSO_4.
机译:采用电位法,伏安法和重量法研究了铜在BMImBr-CuBr_2离子液体(0-30.5 mol%CuBr_2)中的电化学行为。结果表明,铜(II)的电化学还原是不可逆地发生的,在两个单电子阶段(第一阶段和第二阶段的阴极过程的传递系数α分别为0.58和0.46)。 CuBr_2熔体中60°C时含铜离子D_(Cu(II))的扩散系数为1.3×10〜(-7)和1.6×10〜(-7)cm〜2 s〜(-1) BMImBr的浓度分别为0.1和1.5 mol kg〜(-1)。在-2.0至-1.8 V(相对于准参比电极)的电势范围内,可以获得高(高达98%)的沉积效率和高质量的铜沉积。发现铜腐蚀速率随二元熔体中CuBr_2浓度的增加而增加,并且与H_2SO_4-CuSO_4水溶液中的铜腐蚀速率相当。

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