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首页> 外文期刊>CERAMICS INTERNATIONAL >Influence of precursor solution concentration on the microstructure, leakage current and dielectric tunability of Zn-doped Na0.5Bi0.5TiO3 thin films prepared by metal organic decomposition
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Influence of precursor solution concentration on the microstructure, leakage current and dielectric tunability of Zn-doped Na0.5Bi0.5TiO3 thin films prepared by metal organic decomposition

机译:前驱体溶液浓度对金属有机分解制备的Zn掺杂Na0.5Bi0.5TiO3薄膜的微观结构,漏电流和介电可调性的影响

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摘要

Zn-doped Na0.5Bi0.5TiO3 (Zn: NBT) thin films were prepared from precursor solutions with different concentrations (0.08, 0.20 and 035 M) via a metal organic decomposition process. The effects of the mole concentration of precursor solution on crystallization and electrical properties were investigated. All the films exhibit polycrystalline perovskite structure. The increasing degree of predominant (110) orientation with the decrease of the concentration is ascribed to the highly diluted of the solution, leading to the local grain-on-grain growth. Compared with other films, the 0.20 M-film exhibits a strong nonlinear dependence of the dielectric constant on the applied voltage due to the improvement of crystallinity and insulating property. Furthermore, the effect of applied voltage on the dielectric tunability for 0.20 M-film is discussed. A higher tunability of 36.8% and figure of merit of 7.4 in Zn: NBT film can be observed at +/- 16 V and 100 kHz. (C) 2016 Published by Elsevier Ltd.
机译:通过金属有机分解工艺,从具有不同浓度(0.08、0.20和035 M)的前体溶液中制备了Zn掺杂的Na0.5Bi0.5TiO3(Zn:NBT)薄膜。研究了前体溶液的摩尔浓度对结晶和电性能的影响。所有的膜均表现出多晶钙钛矿结构。随浓度的降低,主要(110)取向的增加程度归因于溶液的高度稀释,从而导致了局部晶粒生长。与其他膜相比,由于结晶度和绝缘性能的改善,0.20 M膜的介电常数与施加的电压之间存在很强的非线性相关性。此外,还讨论了施加电压对0.20 M膜介电可调性的影响。在+/- 16 V和100 kHz时,可以观察到Zn:NBT薄膜的36.8%的更高可调性和7.4的品质因数。 (C)2016由Elsevier Ltd.出版

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