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Effects of (Dy, Zn) co-doping on structural and electrical properties of BiFeO_3 thin films

机译:(Dy,Zn)共掺杂对BiFeO_3薄膜结构和电学性能的影响

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Pure BiFeO_3 (BFO) and (Dy, Zn) co-doped (Bi_(0.9)Dy_(0.1))(Fe_(0.975)Zn_(0.025))O_(3-δ) (BDFZO) thin films were prepared on Pt(111)/Ti/SiO_2/Si(100) substrates by a chemical solution deposition method. Effects of (Dy, Zn) co-doping on the structural and electrical properties of BFO were studied. Both the thin films were crystallized as randomly oriented polycrystallinc distorted rhombohedral structures, with no detectable impurity and secondary phases. Large remnant polarization (2P_r) of 47 μC/crrr, low coercive electric field (2E_c) of 925 kV/cm at 1143 kV/cm and low leakage current density of 1.30 × 10~(-6) A/cm~2 at 100 kV were measured for the BDFZO thin film. The improved electrical properties of the BDFZO thin film are ascribed to the stabilization of perovskite structure, defect complex formation between acceptors Zn~(2+) and oxygen vacancies of [(Zn_(Fe~(3+))~(2+))'-(V_(O~(2-))], pronounced off-center displacement in the perovskite and structural distortion by the Dy and Zn ions doping.
机译:在Pt(2)上制备了共掺杂的纯Bi​​FeO_3(BFO)和(Dy,Zn)共掺杂(Bi_(0.9)Dy_(0.1))(Fe_(0.975)Zn_(0.025))O_(3-δ)(BDFZO)薄膜。 111)/ Ti / SiO_2 / Si(100)衬底的化学溶液沉积方法。研究了(Dy,Zn)共掺杂对BFO结构和电学性能的影响。两种薄膜均结晶为随机取向的多晶畸变的菱面体结构,没有可检测到的杂质和第二相。剩余极化强度(2P_r)为47μC/ crrr,1143 kV / cm时的矫顽电场(2E_c)低至925 kV / cm,100时的漏电流密度低至1.30×10〜(-6)A / cm〜2对于BDFZO薄膜,测量了50kV。 BDFZO薄膜电性能的提高归因于钙钛矿结构的稳定,受体Zn〜(2+)与[(Zn_(Fe〜(3 +))〜(2+))的氧空位之间形成缺陷络合物。 '-(V_(O〜(2-))],在钙钛矿中明显偏心位移,并且通过Dy和Zn离子掺杂引起结构变形。

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