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Contrast in four-beam-interference lithography

机译:四光束干涉光刻的对比

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Specific configurations of four linearly polarized, monochromatic plane waves have previously been shown to be capable of producing interference patterns exhibiting the symmetries inherent in all 14 Bravais lattices. We present (1) the range of possible absolute contrasts, (2) the conditions for unity absolute contrast, and (3) the types of interference patterns possible for configurations of four beams interference that satisfy the uniform contrast condition. Results are presented for three Bravais lattice structures: Base- and face-centered cubic and simple cubic.
机译:先前已显示出四个线性偏振,单色平面波的特定配置能够产生干涉图样,这些干涉图样表现出所有14个Bravais晶格固有的对称性。我们提出(1)可能的绝对对比度的范围,(2)绝对绝对对比度的条件,以及(3)对于满足均匀对比度条件的四束干涉配置可能的干涉图案类型。给出了三种Bravais晶格结构的结果:基本和面心立方和简单立方。

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