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首页> 外文期刊>Russian journal of physical chemistry, B. >A self-consistent model for the production and growth of nanoparticles in low-temperature plasmas
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A self-consistent model for the production and growth of nanoparticles in low-temperature plasmas

机译:低温等离子体中纳米粒子产生和生长的自洽模型

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摘要

A theoretical global model is presented for describing the kinetics of generation and growth of clusters and nanoparticles in low-pressure plasmas, where important processes for clusters and grains are collisions with monomers, electrons, and ions and particle coagulation and loss because of diffusion and gas flow drag. Simple equations are given for calculations of monomer density, particle-size distribution function, critical cluster size, the rate of particle production and particle density and mean size, and plasma characteristics (the densities and average energies of "cold" and "hot" electrons and the density of positively charged ions). The model is self-consistent; that is, the above-mentioned properties of clusters, nanoparticles, electrons, and ions are calculated jointly from coupled equations as functions of a small number of radio frequency (RF) discharge parameters (discharge geometry; absorbed electric power; voltage across the RF sheath; gas pressure; composition; and flow rate). Comparisons are made with the experimental data on SiH4-Ar mixtures.
机译:提出了一个理论全局模型来描述低压等离子体中团簇和纳米颗粒的生成和生长动力学,其中团簇和颗粒的重要过程是与单体,电子和离子的碰撞以及由于扩散和气体引起的粒子凝结和损失流阻力。给出了用于计算单体密度,粒度分布函数,临界团簇尺寸,颗粒生成速率,颗粒密度和平均尺寸以及等离子体特性(“冷”和“热”电子的密度和平均能量)的简单方程式和带正电的离子的密度)。模型是自洽的;也就是说,簇,纳米粒子,电子和离子的上述性质是根据​​耦合方程式作为少数射频(RF)放电参数(放电几何形状;吸收的电功率; RF护套上的电压)的函数共同计算的;气体压力;成分和流速)。与SiH4-Ar混合物的实验数据进行了比较。

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