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A first principles study of H2S adsorption and decomposition on a Ge(100) surface

机译:Ge(100)表面上H2S吸附和分解的第一个原理研究

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摘要

We employed density functional theory (DFT) calculations to examine the adsorption configurations and possible reaction paths for H2S on a Ge(100) surface. There are four reaction paths proposed for the decomposition of adsorbed H2S on a Ge(100) surface and the corresponding structural conformations are studied extensively. The present study shows two new possible products and a detailed reaction mechanism for H2S adsorption on a Ge(100) surface and the results are compared with our previous study of H2S adsorption on a Si(100) surface (J. Phy. Chem. C, 115, 2011, 19203). The density of states (DOS) and electron density difference (EDD) analyses are used to illustrate the interaction between S-containing species and surface Ge atoms.
机译:我们采用密度泛函理论(DFT)计算来检查在Ge(100)表面上H2S的吸附构型和可能的反应路径。提出了四种分解Ge(100)表面吸附的H2S的反应路径,并对相应的结构构象进行了广泛的研究。本研究显示了两种新的可能产物以及H2S在Ge(100)表面上吸附的详细反应机理,并将结果与​​我们先前对Si(100)表面上H2S吸附的研究进行了比较(J. Phy.Chem.C ,115,2011,19203)。使用状态密度(DOS)和电子密度差(EDD)分析来说明含S物种与表面Ge原子之间的相互作用。

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