Nano- and micro-fabrications of polystyrene having atactic and syndiotactic structures using focused ion beams lithography

摘要

Micro- and nano-fabrications of polystyrene (PS) having the atactic and syndiotactic structures were carried out with direct maskless etching using focused ion beam (FIB). Micro- and nano-scale structures were obtained with selective beam and material conditions avoiding the beam-heating and charge-up effects. The etching rates were different between atactic and syndiotactic PS. The rate of fabrication for syndiotactic PS shows higher than that of atactic one. Moreover, the direct etching was influenced by the molecular weight. The etching rate for the lower molecular weight became the faster. The FIB direct etching proceeds through the two steps (decomposition and desorption (outgas)). Both decomposition and desorption are influenced by both conformation (morphology) and configuration (stereoregularity). Furthermore, the beam profiles and fluence play the important roles to perform the nano-fabrication of PS.