Using response surface methodology to optimize the stereolithography process

摘要

Purpose - The purpose of this paper is to present a study of the stereolithography apparatus SLA 250-50 motivated by the introduction of the new epoxy resin AccuGen. Design/methodology/approach - Several process variables are examined using a Box-Behnken design and optimization techniques are employed to determine their optimal settings. Findings - The results indicate operating conditions at which high levels of performance can be achieved. Research limitations/implications - The results reported in this research are process specific, however, the methodology employed can be readily applied to different rapid prototyping processes. Practical implications - Effective utilization of the SL process. Originality/value - Quantitative understanding of the process capability in relation to key process variables.