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首页> 外文期刊>Low temperature physics: Simultaneous Russian - English publication >Electron transport and low-temperature electrical and galvanomagnetic properties of zinc oxide and indium oxide films
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Electron transport and low-temperature electrical and galvanomagnetic properties of zinc oxide and indium oxide films

机译:氧化锌和氧化铟膜的电子输运以及低温电磁和电磁性能

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摘要

The electrical and galvanomagnetic properties of zinc oxide films with and without gallium, aluminum, and cobalt doping and of tin-doped indium oxide films are studied over a wide range of temperatures and magnetic fields. It is shown that the mechanism for electron transport in these films changes from band to hopping transport as the degree of crystallinity of the films is reduced because of the methods and conditions for their synthesis. The change in the dimensionality of the films with band electron transport at low temperatures is studied in terms of the weak localization induced by a magnetic field. The localization radius and density of electron states in the Fermi level are estimated for the films with a hopping electron transport. (C) 2015 AIP Publishing LLC.
机译:在很宽的温度和磁场范围内,研究了有和没有镓,铝和钴掺杂的氧化锌膜以及掺锡的氧化铟膜的电和电磁性能。结果表明,由于这些薄膜的合成方法和条件的原因,随着薄膜结晶度的降低,这些薄膜中电子传输的机理从能带跃迁到跳跃传输。根据磁场引起的弱局部化,研究了带电子在低温下的薄膜尺寸变化。对于具有跳跃电子传输的薄膜,估计了费米能级的电子半径的局域半径和密度。 (C)2015 AIP Publishing LLC。

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