KLA-Tencor Introduces ASET-F5X With Advanced Thin Film Measurement Capabilities Down To The 0.1 -Micron Node

摘要

KLA-Tencor, the world leader in yield management and process control solutions for semiconductor manufacturing and related industries, has introduced an enhanced version of its award-winning ASET-F5 thin film measurement system. The new version, known as the ASET-F5x, incorporates a single wavelength ellipsometry (SWE) option to complement the industry-leading spectroscopic ellipsometry (SE) and dual-beam spectrophotometry (DBS) technologies incorporated in the ASET-F5. These combined capabilities provide the accuracy, repeatability and system-to-system matching required for the production of advanced integrated circuits (ICs) with geometries as small as 0.1 micron. In addition, the ASET-F5x is a bridge tool capable of handling either 200 or 300 mm wafers.