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首页> 外文期刊>Nanoscience and Nanotechnology Letters >Structural, Optical, Photoelectrochemical Characteristics of p-Type Sb-Doped AgInS2 Thin Films Prepared by Chemical Bath Deposition Process
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Structural, Optical, Photoelectrochemical Characteristics of p-Type Sb-Doped AgInS2 Thin Films Prepared by Chemical Bath Deposition Process

机译:通过化学浴沉积工艺制备的p型掺Sb的AgInS2薄膜的结构,光学,光电化学特性

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In this study, p-type Sb-doped AgInS2 thin films were prepared on indium-tin oxide (ITO) glass substrates via chemical bath deposition (CBD) process. Various Sb-doped AgInS2 thin films, with varying Sb concentration (0.2, 0.4, 0.6, and 0.8 mM) were prepared. We found the 0.6 mM Sb-doped AgInS2 film had the highest photoelectrochemical performance with photocurrent density of -1.22 mA/cm(2) bias -1.5 V versus SCE reference electrode under a 300 W Xe lamp illumination with the intensity of 100 mW/cm(2). This value was about 4 times higher than the 0.2 mM Sb-doped AgInS2 film. Enhanced photocurrent density was likely the result of the higher charge carrier density introduced by Sb dopant.
机译:在这项研究中,通过化学浴沉积(CBD)工艺在铟锡氧化物(ITO)玻璃基板上制备了p型掺杂Sb的AgInS2薄膜。制备了各种具有不同Sb浓度(0.2、0.4、0.6和0.8 mM)的Sb掺杂AgInS2薄膜。我们发现,在300 W Xe灯照明下,强度为100 mW / cm的SCE参比电极,0.6 mM掺Sb的AgInS2膜具有最高的光电化学性能,光电流密度为-1.22 mA / cm(2)偏压-1.5 V (2)。该值比0.2 mM Sb掺杂的AgInS2膜高约4倍。光电流密度的提高可能是Sb掺杂剂引入的更高载流子密度的结果。

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