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Bandgap tunability at single-layer molybdenum disulphide grain boundaries

机译:单层二硫化钼晶界的带隙可调性

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Two-dimensional transition metal dichalcogenides have emerged as a new class of semiconductor materials with novel electronic and optical properties of interest to future nanoelectronics technology. Single-layer molybdenum disulphide, which represents a prototype two-dimensional transition metal dichalcogenide, has an electronic bandgap that increases with decreasing layer thickness. Using high-resolution scanning tunnelling microscopy and spectroscopy, we measure the apparent quasiparticle energy gap to be 2.40 +/- 0.05 eV for single-layer, 2.10 +/- 0.05 eV for bilayer and 1.75 +/- 0.05 eV for trilayer molybdenum disulphide, which were directly grown on a graphite substrate by chemical vapour deposition method. More interestingly, we report an unexpected bandgap tunability (as large as 0.85 +/- 0.05 eV) with distance from the grain boundary in single-layer molybdenum disulphide, which also depends on the grain misorientation angle. This work opens up new possibilities for flexible electronic and optoelectronic devices with tunable bandgaps that utilize both the control of two-dimensional layer thickness and the grain boundary engineering.
机译:二维过渡金属二卤化物已成为一类新型的半导体材料,具有未来纳米电子技术感兴趣的新颖的电子和光学特性。单层二硫化钼代表二维过渡金属二卤化金属原型,其电子带隙随着层厚度的减小而增加。使用高分辨率扫描隧道显微镜和光谱学,我们测量出单层准视在能隙为2.40 +/- 0.05 eV,双层为2.10 +/- 0.05 eV,三层二硫化钼为1.75 +/- 0.05 eV,通过化学气相沉积法将其直接生长在石墨基底上。更有趣的是,我们报告了单层二硫化钼中距晶界的距离具有意想不到的带隙可调性(高达0.85 +/- 0.05 eV),这也取决于晶粒的取向错误角度。这项工作为具有可调带隙的柔性电子和光电设备打开了新的可能性,该带隙同时利用了二维层厚度的控制和晶界工程。

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