首页> 外文期刊>Nanoscience and Nanotechnology Letters >Cutting Behavior Simulation of a Chemical Mechanical Polishing Particle Using a Three-Dimensional Transient Atomistic FE Model with Nonlinear Spring-Damping Elements
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Cutting Behavior Simulation of a Chemical Mechanical Polishing Particle Using a Three-Dimensional Transient Atomistic FE Model with Nonlinear Spring-Damping Elements

机译:使用带有非线性弹簧阻尼元件的三维瞬态原子有限元模型对化学机械抛光颗粒的切削行为进行仿真

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摘要

During the grinding process, the cutting depth is much smaller than the size of a polishing particle. Therefore, under the small feed scale, polishing particles can be regarded as acting on the copper workpiece linearly. Based on this proposition, a three-dimensional transient atomistic FE model with nonlinear spring-damping elements was constructed. The simulated process involves first fixing the diamond particle on the polishing pad, then pressing down to a fixed depth of 3.7 A, and finally cutting across the copper metal layer that contains the wafer, at a speed of 300 m/s, to remove its atoms. On the basis of simulation results, cutting behaviors of 3D diamond polishing particles, the effect of the cutting nose shape (round, 120°, and 60°), and that of the copper metal layer size were investigated. Concerning the influence of the cutting nose shape, the results revealed that (1) As cutting proceeds, the copper workpiece undergoes an equilibrium stage, a down-pressed stage, and a traverse cutting stage; (2) the shape of the cutting nose affects surface roughness of the copper film, i.e., those processed using a round nose showed the best results and a 120° nose produced similar results as the round nose; (3) the diamond polishing particle is not in contact with the copper workpiece in the beginning, therefore the cutting force, down-pressed force, and lateral force are all zero and start to increase gradually as the diamond particle presses down. When polishing particles start to move horizontally at a speed of 300 m/s, the cutting force, down-pressed force, and lateral force increase with time. Since the cutting tool proceeds in the x direction, the lateral force (F_z) is relatively small and so has no significant effect on the cutting; and (4) the shape of cutting nose affects the cutting force and down-pressed force. A 60° nose has a significant influence on the cutting force (F_x) due to a smaller loading area, which leads to unstable cutting. Changes in the cutting force and down-pressed force when using the 120° and round nose show a similar trend, both resulting in stable cutting. Therefore, it can be deduced that a larger nose angle gives better cutting results. Concerning the effect of the copper workpiece size, the results revealed that: (1) when using 3D diamond polishing particles with a 120° nose on copper film of crystal sizes 24 × 6 × 12 and 24 × 6 × 8, the cutting tool is more restrained on both sides in the z direction due to the smaller dimension in that direction, which leads to a rough surface finish; and (2) for a 24 × 6 × 8 crystal, the cutting force and down-pressed force show slight increases.
机译:在研磨过程中,切割深度远小于抛光颗粒的尺寸。因此,在小进给量的情况下,可以认为抛光颗粒是线性作用在铜工件上的。基于这一命题,建立了具有非线性弹簧阻尼元件的三维瞬态原子有限元模型。模拟过程包括首先将金刚石颗粒固定在抛光垫上,然后向下压至3.7 A的固定深度,最后以300 m / s的速度切割包含晶片的铜金属层,以去除其表面原子。根据模拟结果,研究了3D金刚石抛光颗粒的切削性能,切削鼻形(圆形,120°和60°)以及铜金属层尺寸的影响。关于切削刀尖形状的影响,结果表明:(1)随着切削的进行,铜工件经历平衡阶段,下压阶段和横向切削阶段。 (2)刀鼻的形状会影响铜膜的表面粗糙度,即用圆鼻加工的那些表现出最好的效果,而120°鼻产生的结果与圆鼻相似; (3)金刚石抛光颗粒在开始时不与铜工件接触,因此切削力,下压力和横向力均为零,并随着金刚石颗粒的下压而逐渐增加。当抛光颗粒开始以300 m / s的速度水平移动时,切削力,向下压力和横向力会随时间增加。由于切削刀具沿x方向行进,因此横向力(F_z)相对较小,因此对切削没有明显影响。 (4)刀尖的形状会影响切削力和下压力。 60°的刀头会因较小的装载区域而对切削力(F_x)产生重大影响,从而导致切削不稳定。当使用120°和圆鼻时,切削力和下压力的变化显示出相似的趋势,两者均导致稳定的切削。因此,可以推断出较大的前角可提供更好的切割效果。关于铜工件尺寸的影响,结果表明:(1)当在晶体尺寸为24×6×12和24×6×8的铜膜上使用具有120°鼻角的3D金刚石抛光颗粒时,切削刀具为由于z方向上的尺寸较小,因此在z方向上的两侧都受到更大的约束,从而导致粗糙的表面光洁度; (2)对于24×6×8的晶体,切割力和向下压力显示出轻微的增加。

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