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Multiscale model of near-spherical germanium quantum dots in silicon

机译:硅中近球形锗量子点的多尺度模型

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Atomic displacements, strains and strain energies in the neighbourhood of near-spherical, coherent Ge 'quantum dots' (QD) in crystalline Si and near a {001} Si surface have been predicted by multiscale modelling, by use of a combination of classical molecular dynamics (MD) and Green's function (GF) techniques. The model includes the nonlinear effects at the GeSi interface and allows the boundary of the system to be placed outside the two million atom host crystallite. A modified-embedded-atom-model interatomic potential was used for both MD and GF calculations. Dots of four sizes were analysed, ranging in diameter from 1.1 to 6.5 nm. The supercell size was 34.2 nm. Calculations for strains and displacements in the infinite solid were extended to the {001} surface of the semi-infinite solid using the scheme described previously. Atomic displacements in the infinite solid showed trends generally similar to the early estimate of Mott and Nabarro, but differed in detail, especially for the smaller dots. Surface displacements were broadly similar in magnitude and shape to the classic isotropic continuum solution of Mindlin and Cheng. For large (e.g. 6.5 nm diameter) near-surface dots, the surface displacements are of a magnitude sufficient to be observed by advanced scanned probe microscopy.
机译:通过多尺度建模,结合经典分子的使用,可以预测晶体Si中接近球形,相干的Ge'量子点'(QD)附近和{001} Si表面附近的原子位移,应变和应变能动力学(MD)和格林函数(GF)技术。该模型包括GeSi界面处的非线性效应,并允许将系统边界放置在200万原子主体微晶之外。 MD和GF的计算均使用修改后的嵌入原子模型的原子间势。分析了四种大小的点,直径在1.1到6.5 nm之间。超级单元尺寸为34.2 nm。使用先前描述的方案,将无限固体中的应变和位移的计算扩展到了半无限固体的{001}表面。无限固体中的原子位移通常显示出与Mott和Nabarro的早期估计相似的趋势,但在细节上有所不同,尤其是对于较小的点。表面位移的大小和形状与Mindlin和Cheng的经典各向同性连续体解大致相似。对于大的(例如直径为6.5nm)近表面点,表面位移的大小足以通过高级扫描探针显微镜观察到。

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