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METHOD FOR GROWTH OF GERMANIUM QUANTUM DOTS, GERMANIUM QUANTUM DOT COMPOSITE MATERIAL AND APPLICATION THEREOF

机译:锗量子点,锗量子点复合材料的生长方法及其应用

摘要

The present invention relates to a method for growth of germanium quantum dots. In the method, germanium quantum dots are grown on graphene interfaces with different quantities of layers. In the present invention, ultra-high uniformity graphene interfaces are introduced on a conventional substrate surface, Ge quantum dots are grown on the interfaces, and complicated cleaning processes for obtaining high-quality interfaces are avoided, and process flows are simplified; in addition, the low-matrix element content and the low defect rate of the germanium quantum dots are ensured, a self-organization growth process of the germanium quantum dots is ensured, and germanium quantum dots with good shape and uniformity are formed.
机译:本发明涉及一种锗量子点的生长方法。在该方法中,锗量子点生长在具有不同层数的石墨烯界面上。在本发明中,将超高均匀度的石墨烯界面引入常规的基板表面,在界面上生长Ge量子点,避免了用于获得高质量界面的复杂清洗工艺,并简化了工艺流程。另外,确保了锗量子点的低矩阵元素含量和低缺陷率,确保了锗量子点的自组织生长过程,并形成了形状和均匀性良好的锗量子点。

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