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The synthesis and structural characterization of boron-doped silicon-nanocrystals with enhanced electroconductivity

机译:导电性增强的掺硼硅纳米晶体的合成与结构表征

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Boron (B)-doped silicon-nanocrystals (Si-NCs) with wavelength-tunable photoluminescence (PL) properties in the visible region are successfully prepared for the first time, leading to significant enhancement of electroconductivities. The B-doped Si-NCs are prepared on a p-type Si(100) substrate by co-deposition of p-type Si(100) chips/boron chips/silica disk targets. As the number of the B chips used as the target is increased, the amount of doped B content increases gradually. Here the amount of doped B content in the Si-NCs is controlled from 0 to 0.4, 0.7, 2.3 at.%. The B elemental states, compositional ratios, and surface condition of the obtained Si-NCs are fully characterized by high-resolution transmission electron microscopy (HRTEM) observations, micro-Raman scattering spectroscopic analysis, etc. Our B-doped Si-NCs possess both the continuous luminescence property in the visible region and enhanced electroconductivity. The red-shift of the PL peak is confirmed by the increase of the amount of doped B content. This paper should be very important from the viewpoint of application to optoelectronic devices and electroluminescent (EL) displays.
机译:首次成功制备了在可见光区域具有波长可调光致发光(PL)特性的掺硼(B)的硅纳米晶体(Si-NC),从而大大提高了电导率。通过共沉积p型Si(100)芯片/硼芯片/二氧化硅盘靶,在p型Si(100)衬底上制备掺杂B的Si-NC。随着用作靶的B芯片的数量增加,掺杂的B含量的量逐渐增加。在此,将Si-NC中掺杂的B含量的量控制为0至0.4、0.7、2.3原子%。所获得的Si-NC的B元素状态,组成比和表面条件通过高分辨率透射电子显微镜(HRTEM)观察,显微拉曼散射光谱分析等得到充分表征。我们的B掺杂Si-NC兼具两者在可见光区域具有连续发光特性,并增强了导电性。 PL峰的红移由掺杂B含量的增加所证实。从光电器件和电致发光(EL)显示器的应用角度来看,本文应该是非常重要的。

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