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Inhomogeneous broadening and alloy intermixing in low proton dose implanted InAs/GaAs self-assembled quantum dots

机译:低质子剂量注入的InAs / GaAs自组装量子点的不均匀扩宽和合金混合

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摘要

In this work, low-temperature photoluminescence (PL) and photoluminescence excitation (PLE) experiments have been carried out to investigate the optical and electronic properties of InAs/GaAs quantum dots (QDs) subjected to room-temperature proton implantation at various doses (5 x 10(10) - 10(14) ions cm(-2)) and subsequent thermal annealing. The energy shift of the main QD emission band is found to increase with increasing implantation dose. Our measurements show clear evidence of an inhomogeneous In/Ga intermixing at low proton implantation doses (<= 5 x 10(11) ions cm(-2)), giving rise to the coexistence of intermixed and non-intermixed QDs. For higher implantation doses, a decrease of both the PL linewidth and the intersublevel spacing energy have been found to occur, suggesting that the dot-size, dot-composition and dot-strain distributions evolve towards more uniform ones.
机译:在这项工作中,已经进行了低温光致发光(PL)和光致发光激发(PLE)实验,以研究在不同剂量下进行室温质子注入的InAs / GaAs量子点(QD)的光学和电子性质(5 x 10(10)-10(14)离子cm(-2)),然后进行热退火。发现主QD发射带的能量位移随注入剂量的增加而增加。我们的测量结果清楚表明,在低质子注入剂量(<= 5 x 10(11)离子cm(-2))下In / Ga不均匀混合,导致混合QD和非混合QD并存。对于更高的注入剂量,已经发现PL线宽和子级间距能量都减小了,这表明点尺寸,点组成和点应变分布向着更均匀的方向发展。

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