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High current density esaki tunnel diodes based on GaSb-InAsSb heterostructure nanowires

机译:基于GaSb-InAsSb异质结构纳米线的高电流密度esaki隧道二极管

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摘要

We present electrical characterization of broken gap GaSb-InAsSb nanowire heterojunctions. Esaki diode characteristics with maximum reverse current of 1750 kA/cm~2 at 0.50 V, maximum peak current of 67 kA/cm~2 at 0.11 V, and peak-to-valley ratio (PVR) of 2.1 are obtained at room temperature. The reverse current density is comparable to that of state-of-the-art tunnel diodes based on heavily doped p-n junctions. However, the GaSb-InAsSb diodes investigated in this work do not rely on heavy doping, which permits studies of transport mechanisms in simple transistor structures processed with high-κ gate dielectrics and top-gates. Such processing results in devices with improved PVR (3.5) and stability of the electrical properties.
机译:我们提出了破间隙GaSb-InAsSb纳米线异质结的电学表征。 Esaki二极管特性在室温下获得的最大反向电流为0.50 V时为1750 kA / cm〜2,最大峰值电流为0.11 V时为67 kA / cm〜2,峰谷比(PVR)为2.1。反向电流密度与基于重掺杂p-n结的最新隧道二极管相当。然而,在这项工作中研究的GaSb-InAsSb二极管不依赖于重掺杂,这允许研究使用高κ栅极电介质和顶栅处理的简单晶体管结构中的传输机制。这样的处理导致具有改善的PVR(3.5)和电性能稳定性的器件。

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