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首页> 外文期刊>Applied Physics Letters >Benchmarking current density in staggered gap In0.53Ga0.47As/GaAs0.5Sb0.5 heterojunction Esaki tunnel diodes
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Benchmarking current density in staggered gap In0.53Ga0.47As/GaAs0.5Sb0.5 heterojunction Esaki tunnel diodes

机译:交错间隙In0.53Ga0.47As / GaAs0.5Sb0.5异质结Esaki隧道二极管中的基准电流密度

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摘要

The impact of dopant concentration on the current densities of In0.53Ga0.47As/GaAs0.5Sb0.5 heterojunction Esaki tunnel diodes is investigated. Increased doping density results in increased peak and Zener current densities. Two different structures were fabricated demonstrating peak current densities of 92?kA/cm2 and 572?kA/cm2, Zener current densities of 994?kA/cm2 and 5.1 MA/cm2 at a -0.5?V bias, and peak-to-valley current ratios of 6.0 and 5.4, respectively. The peak current scaled linearly with area down to a 70?nm diameter. The peak current densities were benchmarked against Esaki diodes from other material systems based on doping density and tunnel barrier height.
机译:掺杂剂浓度对In 0.53 Ga 0.47 As / GaAs 0.5 Sb 0.5 异质结Esaki电流密度的影响研究了隧道二极管。掺杂密度的增加导致峰值和齐纳电流密度的增加。制造了两种不同的结构,其峰值电流密度分别为92?kA / cm 2 和572?kA / cm 2 ,齐纳电流密度为994?kA / cm 2在-0.5?V偏压下为2 和5.1 MA / cm 2 ,峰谷电流比分别为6.0和5.4。峰值电流线性减小,直径减小到70?nm。根据掺杂密度和隧道势垒高度,将峰值电流密度与其他材料系统的Esaki二极管进行了比较。

著录项

  • 来源
    《Applied Physics Letters》 |2013年第21期|1-4|共4页
  • 作者单位

    Department of Electrical and Microelectronic Engineering, Rochester Institute of Technology, Rochester, New York 14623, USA|c|;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
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